Toshiba Mitsubishi-Electric Industrial Systems Corp (TMEIC) released a machine that can form a transparent conductive film for solar cells in a non-vacuum process.
With the machine, "TMmist," it becomes possible to reduce installation area and manufacturing costs as well as to improve the conversion efficiency of solar cells.
For the TMmist, TMEIC employed a method called "mist CVD method." In the method, the solution of a film material is atomized by using ultrasonic waves, and, then, it is decomposed and reacted on a substrate to form a thin film. Unlike a sputtering machine, the TMmist does not cause plasma damage to a substrate. Therefore, it is expected to improve the power generation efficiency and quality of solar panels.