NanoGram Corp, a developer and manufacturer of advanced products and solutions for optical, electronic and energy applications, has extended its relationship with Tokyo Electron Ltd (TEL) from strategic investor to technology and market development partner by entering into a joint development agreement (JDA).
The JDA will focus on developing advanced thin-film deposition tools based on NanoGram's patented laser reactive deposition (LRD) process for silicon. The platform will target the thin-film photovoltaics market, which is expected to grow to 40% of the entire PV market by 2012 according to the Prometheus Institute.
NanoGram's LRD process has a distinct rate advantage with the capability to deposit amorphous and microcrystalline silicon faster than conventional CVD processes. The development work is also expected to be complementary to NanoGram's low-cost multicrystalline SilFoil PV module business.
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